VIGILANT POWER MONITOR

Vigilant Power Monitor - Avanced digital RF VI Probe

 

 


Advanced RF Power Diagnostic for Plasma Processing Applications (digital vi probe)

Benefits

  • Customized to your application
  • Plug & Play diagnostics
  • High power rating

Users


Researchers

R&D engineers

Process engineers

Equipement maintenance engineers

Applications


Study of RF discharges

Development of processing tools

Process control

Troubleshooting of RF systems


The Vigilant Power Monitor tracks the RF power delivery in your plasma processing reactor by complete and accurate of RF parameters (power, voltage, current, phase shift, impedance, harmonics...) with minimum perturbation. This probe can be inserted before or after the matching unit inside your plasma system.

 

We combine many proprietary innovations to offer what is probably the most advanced RF power diagnostics for plasma applications commercially available today:

 

- Customizable high performance electrical sensors: wideband, robust, low-perturbation and compact voltage and current sensors developed through extensive experimental work and electromagnetic modeling. The characteristics of these sensors are customized during calibration to maximize performance for your application (maximized sensitivity and power rating while minimizing the perturbation).

 

- High speed / high resolution cutting edge acquisition electronics with USB connectivity to sample directly and simultaneously the RF voltage and current waveforms.

 

- Automated highly accurate calibration process to ensure the best measurement accuracy and probe-to-probe repeatability. Our calibration process is NIST-traceable and uses the best electronic test instruments available today in a temperature and EMI controlled environment.

 

- Powerful and intuitive user interface software (Vigilant RF Lab) to display in real-time the measured data which transforms the PC of the user into a state of the art RF laboratory.

Specifications

Frequency band

RF excitation mode

Max power

Accuracy of power measurement

Max voltage

Max current

Insertion loss

Connections

Size

Software

1-150 MHz (1-500MHz on request)

Single frequency (CW, pulsed, frequency agile)

10 kW

+/- 2% on a matched load at the excitation frequency

5kV (peak)

100A (peak)

<0.5% at the excitation frequency

50Ω coaxial line with customized input & output connectors

90mm x 220mm x 40mm (without connectors)

One Vigilant RF Lab licence


Ordering information

In order to provide you with the best suitable probe for your application, please use the following model numbering:

 

VPM-FREQ-POWER-IN-OUT                    (Example: VPM-13.56-1000-1F-1M)                     

Code Details Values             C: Custom (if not listed)
 FREQ Excitation frequency in MHz  2, 3.39, 4, 6.78, 13.56, 27.12, 40.68, 60, 81.36
POWER Max generator power in Watt 30, 60, 100, 300, 600, 1000, 3000, 6000, 10000

IN

OUT

Input connector type and gender

Output connector type and gender

0: No connector (M5 threaded hole)

    1F: N Female                     1M: N Male      

2F: HN Female                   2M: HN Male

   3F: 7/16 Female                  3M: 7/16 Male

4F: LC Female                    4M: LC Male

 

Datasheet

Vigilant Power Monitor Datasheet
Advanced digital RF vi probe for plasma processing applications
VPM Datasheet.pdf
Adobe Acrobat Document 2.8 MB

Citations in peer-reviewed journals

2016

 

Spatial Dependence of DNA Damage in Bacteria due to Low-Temperature Plasma Application as Assessed at the Single Cell Level

Angela Privat-Maldonado1,2, Deborah O’Connell2, Emma Welch1, Roddy Vann2, Marjan W. van der Woude1

1 Centre for Immunology and Infection, Department of Biology and Hull York Medical School, University of York, York, U.K

2 York Plasma Institute, Department of Physics, University of York, York, U.K

 

Abstract

Low temperature plasmas (LTPs) generate a cocktail of reactive nitrogen and oxygen species (RNOS) with bactericidal activity. The RNOS however are spatially unevenly distributed in the plasma. Here we test the hypothesis that this distribution will affect the mechanisms underpinning plasma bactericidal activity focussing on the level of DNA damage in situ. For the first time, a quantitative, single cell approach was applied to assess the level of DNA damage in bacteria as a function of the radial distance from the centre of the plasma jet. Salmonella enterica on a solid, dry surface was treated with two types of LTP: an atmospheric-pressure dielectric barrier discharge plasma jet (charged and neutral species) and a radio-frequency atmospheric-pressure plasma jet (neutral species). In both cases, there was an inverse correlation between the degree of DNA damage and the radial distance from the centre of the plasma, with the highest DNA damage occurring directly under the plasma. This trend was also observed with Staphylococcus aureus. LTP-generated UV radiation was eliminated as a contributing factor. Thus valuable mechanistic information can be obtained from assays on biological material, which can inform the development of LTP as a complementary or alternative therapy for (topical) bacterial infections.

 

Source: Scientific Reports Vol. 6, Article number: 35646 (2016) http://dx.doi.org/10.1038/srep35646