application example VIdeos
Measurement of RF Pulses in a Reactive CCP Discharge
We use the Vigilant Power Monitor and the Vigilant RF Lab to measure the RF pulses in a reactive CCP discharge.
Excitation frequency: 13.56 MHz pulsed at 1 kHz (50% Duty cycle)
Gas: H2
Pressure: 100 mTorr
Equipment: RIE System from Nano-Master Inc. (NRE-3500)
Measurement of RF Harmonics in a Pulsed CCP Discharge
We use the Vigilant Power Monitor and the Vigilant RF Lab to measure the RF harmonics during the RF pulses in a reactive CCP discharge.
Excitation frequency: 13.56 MHz pulsed at 1 kHz (50% Duty cycle)
Gas: H2
Pressure: 100 mTorr
Equipment: RIE System from Nano-Master Inc. (NRE-3500)
Measurement of RF Harmonics in a Reactive CCP Discharge
The Vigilant Power Monitor and the Vigilant RF Lab are used to measure the RF harmonics in a SF6/O2 CCP discharge.
Excitation frequency: 13.56 MHz
Gas: SF6/O2 (electronegative gas)
Pressure: 50 mTorr
Equipment: RIE System from Nano-Master Inc. (NRE-3500)
Measurement during a Power Ramp in a CCP Discharge
The Vigilant Power Monitor and the Vigilant RF Lab are used to measure the dissipated power during a power ramp inside an CCP discharge.
Excitation frequency: 13.56MHz
Gas: Argon
Pressure: 30 mTorr
Equipment: RIE System from Nano-Master Inc. (NRE-3500)
Study of the Capacitive-to-Inductive Mode Transition Instability
The Vigilant Power Monitor and the Vigilant RF Lab are used to study the capacitive-to-inductive mode transition (E-to-H transition) instability inside an ICP discharge.
Excitation frequency: 13.56 MHz
Gas: Chlorine (electronegative gas)
Pressure: 86 mTorr
Study of RF Plasmas at Very Low Power
We demonstrate the capability of the Vigilant Power Monitor and the Vigilant RF Lab to perform reliable measurements in a plasma discharge in the worst conditions: very low dissipated power (below 10W) and very high reflected power (99%). There is no data averaging performed.
Excitation frequency: 13.56 MHz
Gas: Oxygen (electronegative gas)
Pressure: 30 mTorr
Measurement of the Inductance of an ICP Coil
We use the Vigilant Power Monitor and the Vigilant RF Lab to measure the inductance of an ICP coil exciting a plasma discharge.
Excitation frequency: 13.56 MHz
Gas: Chlorine (electronegative gas)
Pressure: 40 mTorr
Measurement of the Resistance of an ICP Coil
We use the Vigilant Power Monitor and the Vigilant RF Lab to measure the resistance of an ICP coil exciting a plasma discharge.
Excitation frequency: 13.56 MHz
Gas: Chlorine (electronegative gas)
Pressure: 40 mTorr
Study of Electrical Instabilities in Unmatched Reactors
The Vigilant Power Monitor and the Vigilant RF Lab are used to study the low frequency instabilities inside an ICP reactor in unmatched conditions. The discharge (non linear electrical load) and the resonant behavior of the matching network interact with the control system of the RF power generator to induce these low frequency instabilities.
Excitation frequency: 13.56 MHz
Gas: Argon
Pressure: 15 mTorr